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Semiconductor materials and interfacesCopper Interconnects and ReliabilityNanowire Synthesis and Applications

Precise evaluation of silicided source/drain contacts using the bridge-contact resistance method

Se-Hoon Hwang, Bogeun Son, H. Lee, Jiyeong Yun, Honghwi Park, Hongsik Park

2026.6.1SOLID-STATE ELECTRONICS

DOI: 10.1016/j.sse.2026.109385

Abstract

Abstract is not available.

Citation format

HWANG, Se-Hoon, et al. Precise evaluation of silicided source/drain contacts using the bridge-contact resistance method. SOLID-STATE ELECTRONICS, 2026, 236: 109385.