tlooto
Sign up
Advancements in Semiconductor Devices and Circuit DesignSemiconductor materials and devicesVLSI and Analog Circuit Testing

Deep learning-based prediction of line edge roughness-induced variability in dual-gate FinFETs

P. Roseline, V. Kavitha

2026.6.1Journal of Computational Electronics

DOI: 10.1007/s10825-026-02578-5

Abstract

Abstract is not available.

Citation format

ROSELINE, P.; KAVITHA, V. Deep learning-based prediction of line edge roughness-induced variability in dual-gate finfets. Journal of Computational Electronics, 2026, 25(3).