Topological Materials and PhenomenaAdvanced Thermoelectric Materials and DevicesQuantum and electron transport phenomena

E. Rogacheva, O. Pavlosiuk, T. Shelest, O. Nashchekina, D. Kaczorowski

2026.4.1Thin Solid Films

DOI: 10.1016/j.tsf.2026.140949

Abstract

Abstract is not available.

Citation format

ROGACHEVA, E., et al. Effect of nonstoichiometry on quantum interference phenomena and electron–electron interaction in topological insulator bi2te3 thin films. Thin Solid Films, 2026, 843: 140949.