tlooto
Sign up
Synthesis and properties of polymersSurface Modification and SuperhydrophobicityNanomaterials and Printing Technologies

Research on the Regulation of Polyimide Film Microstructure and Its O2 Plasma Etching Behavior in the Drying Process

Peishuai Xing, Xiaodong Guo, Yang Wang, Sixi Zha, Zeting Chen, Shicheng Shen, Bin He, Tianyun Li, Yuning Zhao

2026.1.1JOURNAL OF POLYMER MATERIALS

DOI: 10.32604/jpm.2026.077304

Abstract

Abstract is not available.

Citation format

XING, Peishuai, et al. Research on the regulation of polyimide film microstructure and its o2 plasma etching behavior in the drying process. JOURNAL OF POLYMER MATERIALS, 2026, 43(2): 1–10.