Thin-Film Transistor TechnologiesCopper Interconnects and ReliabilitySilicon Nanostructures and Photoluminescence
M. Yoon, H. Yeom, Jung‐Hyung Kim, Hyo‐Chang Lee
Abstract
Go to Abstract 1. Introduction 2. Experimental details 3. Results and discussion 4. Conclusion Acknowledgments Conflicts of Interest Reference
Citation format
YOON, M., et al. Effect of substrate temperature on the deposition characteristics of hydrogenated nanocrystalline silicon thin film in plasma-enhanced chemical vapor deposition process. Applied Science and Convergence Technology, 2026, 35(1): 45–49.