EngineeringPhysics

Shunsuke Shoji, Nobutaka Oi, Sora Kawai, Ryo Yoshida, K. Ota, A. Watanabe, I. Omura, K. Ueda, T. Fujishima

2026.2.24Applied Physics Express

DOI: 10.35848/1882-0786/ae49df

Abstract

The field plate structure is effective technique for improving breakdown characteristics. In this work, the gate field plate (GFP) diamond metal-oxide-semiconductor field-effect transistor (MOSFET) satisfied with both ampere-class current capability and high breakdown voltage is demonstrated for the first time. The maximum drain current of fabricated device was 0.82 A with breakdown voltage of 550 V. From double pulse test, the rise time and fall time are 56 ns and 15 ns, respectively, even at supply voltage of −200 V and drain current of 1 A. These results indicate that diamond MOSFET is promising for power devices.

Citation format

SHOJI, Shunsuke, et al. Field plate multi-finger diamond MOSFET with ampere-class current capability and a breakdown voltage of 550 v. Applied Physics Express, 2026, 19(3): 031002.