Shunsuke Shoji, Nobutaka Oi, Sora Kawai, Ryo Yoshida, K. Ota, A. Watanabe, I. Omura, K. Ueda, T. Fujishima
2026.2.24Applied Physics Express
Abstract
The field plate structure is effective technique for improving breakdown characteristics. In this work, the gate field plate (GFP) diamond metal-oxide-semiconductor field-effect transistor (MOSFET) satisfied with both ampere-class current capability and high breakdown voltage is demonstrated for the first time. The maximum drain current of fabricated device was 0.82 A with breakdown voltage of 550 V. From double pulse test, the rise time and fall time are 56 ns and 15 ns, respectively, even at supply voltage of −200 V and drain current of 1 A. These results indicate that diamond MOSFET is promising for power devices.
Citation format
SHOJI, Shunsuke, et al. Field plate multi-finger diamond MOSFET with ampere-class current capability and a breakdown voltage of 550 v. Applied Physics Express, 2026, 19(3): 031002.