The Performance of Organic Field Effect Transistor Affected by Different Thickness of Active Semiconductor Layer and Thickness of Gate Insulator

The purpose of this paper is to fabricate organic field effect transistor and to investigate the effect of the thickness of the pentacene active layer and the thickness of gate insulator layer on MOSFET performance. The fabricated structure is top-contact. When the thickness of the insulator gate layer increases from 10 nm to 30 nm, the magnitude of the drain source current, when VGS = VDS = -4 V, decreases from 1813 nA to 214 nA and then the threshold voltage shifts from -1.4 V to -2.4 V. When the thickness of the pentacene increases from 9 nm to 40 nm, the threshold voltage voltage shifts slightly in the negative direction from -1.4 V to -1.6 V for SiO2 thickness of 10 nm. In case of SiO2 thickness of 20 nm, the threshold voltage voltage shifts from -1.9 V to -2.2 V. In case of SiO2 thickness of 30 nm, the threshold voltage voltage shifts from -2.4 V to -2.9 V. Besides that, the mobility decreases from around 0.31 cm2/(Vs) to 0.15 cm2/(Vs) when the pentacene thickness increases from 9 nm to 40 nm.