Open AccessPhysicsEngineeringMaterials Science

M. Lemme, T. Echtermeyer, M. Baus, H. K. A. M. C. Aachen, A. GmbH, Aachen, Germany, Institute of Semiconductor Electronics, Rwth Aachen University

2007.3.8IEEE ELECTRON DEVICE LETTERS

DOI: 10.1109/led.2007.891668

Abstract

In this letter, a top-gated field-effect device (FED) manufactured from monolayer graphene is investigated. Except for graphene deposition, a conventional top-down CMOS-compatible process flow is applied. Carrier mobilities in graphene pseudo-MOS structures are compared to those obtained from the top-gated Graphene-FEDs. The extracted values exceed the universal mobility of silicon and silicon-on-insulator MOSFETs

Citation format

LEMME, M., et al. A graphene field-effect device [preprint]. arXiv, 2007. arXiv:cond-mat/0703208.