Open AccessPhysicsEngineeringMaterials Science
M. Lemme, T. Echtermeyer, M. Baus, H. K. A. M. C. Aachen, A. GmbH, Aachen, Germany, Institute of Semiconductor Electronics, Rwth Aachen University
2007.3.8IEEE ELECTRON DEVICE LETTERS
Abstract
In this letter, a top-gated field-effect device (FED) manufactured from monolayer graphene is investigated. Except for graphene deposition, a conventional top-down CMOS-compatible process flow is applied. Carrier mobilities in graphene pseudo-MOS structures are compared to those obtained from the top-gated Graphene-FEDs. The extracted values exceed the universal mobility of silicon and silicon-on-insulator MOSFETs
Citation format
LEMME, M., et al. A graphene field-effect device [preprint]. arXiv, 2007. arXiv:cond-mat/0703208.