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EngineeringMaterials SciencePhysics

Anisotropic Etching of SiO2 in High-Voltage Gas-Discharge Plasmas

N. L. Kazanskiĭ, V. A. Kolpakov, A. I. Kolpakov

2004.5.1Russian Microelectronics

DOI: 10.1023/b:rumi.0000026175.29416.eb

Abstract

Abstract is not available.

Citation format

KAZANSKIĬ, N. L.; KOLPAKOV, V. A.; KOLPAKOV, A. I. Anisotropic etching of sio2 in high-voltage gas-discharge plasmas. Russian Microelectronics, 2004, 33: 169–182.