Open AccessMaterials ScienceEngineering

Y. Hirai, S. Yoshida, A. Okamoto, Yoshio Tanaka, M. Endo, S. Irie, H. Nakagawa, M. Sasago

2001JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

DOI: 10.2494/photopolymer.14.457

Abstract

Abstract is not available.

Citation format

HIRAI, Y., et al. Mold surface treatment for imprint lithography. JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2001, 14: 457–462.