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Deposition of metal chalcogenide thin films by successive ionic layer adsorption and reaction (SILAR) method

H. Pathan, C. Lokhande

2004.4.1BULLETIN OF MATERIALS SCIENCE

DOI: 10.1007/bf02708491

Abstract

Abstract is not available.

Citation format

PATHAN, H.; LOKHANDE, C. Deposition of metal chalcogenide thin films by successive ionic layer adsorption and reaction (SILAR) method. BULLETIN OF MATERIALS SCIENCE, 2004, 27: 85–111.