EngineeringPhysicsMaterials Science

Extreme Ultraviolet Photoresist Inspection Platform in Shanghai Synchrotron Radiation Facility

Zhao Jun, Yang Shu-Min, Xue Chao-Fan, Wu Yan-Qing, Chen Yi-fang, Tai Ren-zhong

2021.9.1Chinese Journal of Applied Chemistry

DOI: 10.19894/j.issn.1000-0518.210190

Abstract

Abstract is not available.

Citation format

JUN, Zhao, et al. Extreme ultraviolet photoresist inspection platform in shanghai synchrotron radiation facility. Chinese Journal of Applied Chemistry, 2021, 38: 1168.