SCIESCOPUSQ2

PLASMA CHEMISTRY AND PLASMA PROCESSING

SPRINGER, United States

PLASMA CHEMISTRY AND PLASMA PROCESSING is an academic journal published by SPRINGER (United States). Identifiers: ISSN 0272-4324, eISSN 1572-8986. Indexed in SCIE, SCOPUS. Metrics: JIF 2.5, CiteScore 5.1, SJR 0.462, SNIP 0.85. Subject areas: APPLIED, CHEMICAL, ENGINEERING, FLUIDS & PLASMAS. tlooto lists 2,602 papers from this journal.

CiteScore

5.10

Scopus citation metric

SJR

0.462

SCImago rank

SNIP

0.85

Source normalized impact

Percentage rank

-

JIF percentile rank

Journal profile

ISSN
0272-4324
eISSN
1572-8986
Abbreviation
PLASMA CHEM PLASMA P
Publisher
SPRINGER
Country
United States

Web of Science categories

SCIEAPPLIED, CHEMICAL, ENGINEERING, FLUIDS & PLASMAS, PHYSICS

Scopus ASJC categories

150016002508 Surfaces3104 Condensed Matter Physics

Keywords

Engineering, Chemical | Physics, Applied | Physics, Fluids & Plasmas

Papers in this journal