SCIEQ3
Journal of Micro-Nanopatterning Materials and Metrology-JM3
SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
Journal of Micro-Nanopatterning Materials and Metrology-JM3 is an academic journal published by SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS. Identifiers: ISSN 1932-5150, eISSN 2708-8340. Indexed in SCIE. Metrics: JIF 1.8. Subject areas: ELECTRICAL & ELECTRONIC, ENGINEERING, MATERIALS SCIENCE, MULTIDISCIPLINARY. tlooto lists 155 papers from this journal.
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Journal profile
- ISSN
- 1932-5150
- eISSN
- 2708-8340
- Abbreviation
- J MICRO-NANOPATTERN
- Publisher
- SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
- Country
- -
Web of Science categories
SCIEELECTRICAL & ELECTRONIC, ENGINEERING, MATERIALS SCIENCE, MULTIDISCIPLINARY, NANOSCIENCE & NANOTECHNOLOGY, OPTICS
Scopus ASJC categories
No ASJC category data available.
Keywords
Engineering, Electrical & Electronic | Nanoscience & Nanotechnology | Materials Science, Multidisciplinary | Optics
Papers in this journal
Recent papers
- Lithography hotspot correction on post-OPC layout using generative adversarial networks
2026
- Optimizing experimental design for fast and accurate CD metrology of interconnects using coherent extreme-ultraviolet scatterometry
2026 · 1 citations
- Dry resist process development toward depth of focus improvement in high NA EUV lithography
2026 · 1 citations
- Regulation of silicon bottom corner flatness through multi-parameter collaborative optimization in deep reactive ion etching
2026
- Fundamental understanding of exposure and process chemistry of Sn-based metal oxide resists: effects of ambient environment during post-exposure delay and bake
2026 · 1 citations
Most cited papers
- Process and materials compatibility considerations for introducing novel extreme ultraviolet resists in a fab: a guide for academia and entrepreneurs
2025 · 4 citations
- Fundamental understanding of exposure and process chemistry of Sn-based metal oxide resists: effects of ambient environment during post-exposure delay and bake
2026 · 2 citations
- Lithography hotspot detection method based on convolution kernel reconstruction
2025 · 2 citations
- X-ray metrology for advanced semiconductor manufacturing of next-generation logic devices
2026 · 1 citations
- Global warming impact assessment of abatement systems for extreme ultraviolet lithography in wafer production: effect of hydrogen recycling and electricity sourcing
2026 · 1 citations